สถาบันวิจัยแสงซินโครตรอน (องค์การมหาชน)

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Technology / Beamline System / Beamline 8W

Beamline Layout and Specification

Beamline Layout and Specification

BL8 Optical Layout

Fig. 1 Simplified schematic of BL8 from source to sample
Fig. 1 Simplified schematic of BL8 from source to sample.
Fig. 2 Schematic view of the upgraded BL8 beamline
Fig. 2 Schematic view of the upgraded BL8 beamline illustrating photon absorbers (ABS), pneumatic valves (PV), low conductance duct (LCD), vertical slit (V-slit), horizontal slit (H-slit), X-ray beam position monitors (XBPM), fluorescent screens (FS), white beam shutter (WBS), double crystal monochromator (DCM), monobeam shutter (MBS).

Specification

Bending magnet X-ray source

The CM system mainly consists of a rhodium-coated, single-crystal silicon flat mirror (Thales-SESO, France), a motorized bender (TOYAMA Co. LTD, Japan), five motorized stages (Oriental motor USA Corp., USA), a UHV chamber (SLRI, Thailand), and supporting granite. The size of mirror, 600 mm (length) × 50 mm (width) × 40 mm (height), is designed at an incident angle of 5 mrad for accepting most photons of 1 – 13 keV.

Table 1 Technical Specifications of XAS

X-ray source, optics, and upgraded specification of the beamline.

Technique X-ray absorption spectroscopy (XANES and EXAFS)
Energy range 1 keV to 13 keV
Photon flux Maximum flux about 3 × 1011 phs/s/100 mA is currently available for the Si, P, S, and Cl K-edges.
The lowest photon flux is 4 × 107 phs/s/100 mA at the Pb L3-edge.
Beam size at sample Defocused (standard): 13 mm (h) × 1.5 mm (v)
Focused down to 1 × 1 mm
X-ray source 1.44 T Bending Magnet
Electron beam energy 1.2 GeV
Electron beam current 150 mA – 80 mA
Collimating mirror Bendable, Rh-coated, single crystal silicon mirror
Monochromator Fixed-exit double crystal monochromator

Table 2 Technical Specifications of XFI

Technique X-ray Fluorescence Imaging
Energy excitation 10 keV
Photon flux 109 phs/s/100 mA
Detector pnCCD with polycapillary optics
Image size at sample 12.3 mm × 12.3 mm, 256 × 256 pixels
Spatial resolution ~68 µm
Detection limit 3.9 wt% (K) → 0.2 wt% (Zn)
X-ray source 1.44 T Bending Magnet
Electron beam energy 1.2 GeV
Electron beam current 150 mA – 80 mA
Collimating mirror Bendable, Rh-coated, single crystal silicon mirror
Monochromator Fixed-exit double crystal monochromator

Monochromator Crystals

Crystal type 2d spacing (Å) Photon energy range (eV) Measurable element
Beryl(10-10) 7.98 1250 – 4780 Mg
KTP(011) 10.955 1250 – 4780 Al
InSb(111) 7.481 1830 – 7000 Si to Cl (K-edge)
Rb to Cd (L3-edge)
Si(111) 6.271 2180 – 8350 K (K-edge)
In to Sb (L3-edge)
Ge(220) 4.001 3440 – 13000 Energy higher than 3.7 keV
Fig. 3 Photon flux at sample in the 1–13 keV region from the DCM crystals
Fig. 3 Photon flux at sample in the 1 – 13 keV region obtained from the DCM crystals: Beryl(10-10) shown by circles; KTP(011), triangles; InSb(111), diamonds; and Ge(220), squares. The opened and closed symbols indicate the photon flux measured before and after the beamline upgrade, respectively.