Beamline Layout and Specification
Beamline Layout and Specification
Beamline 5.2 Optical Layout
The beam transport system consists of the following main sections:
- Front End: Located immediately after the storage ring, with safety shutters and fast valves that isolate the beamline vacuum from the storage ring.
-
Optics Section: Contains the heat absorber, X-ray beam position monitor and double crystal
monochromator.
- Heat Absorber (ABS): Protects downstream optical components from the high heat load of the white X-ray beam.
- X-ray Beam Position Monitor (XBPM): Monitors the vertical position and intensity of the incident beam.
- Double Crystal Monochromator (DCM): Selects the monochromatic X-ray energy using changeable InSb(111), Ge(220) or Si(111) crystals.
Beamline 5.2 Specification
| Parameter | Specification |
|---|---|
| Energy range | 1,810 – 13,000 eV |
| Photon flux | 108 – 1010 photons/sec/100 mA |
| Energy resolution | 2 × 10−4 |
| X-ray source | 1.44 T bending magnet |
| Beam energy | 1.2 GeV |
| Beam current | 70 – 150 mA |
| Monochromator | Fixed-exit double crystal monochromator |
Crystals Available at Beamline 5.2
| Crystal | 2d spacing | Energy range |
|---|---|---|
| InSb(111) | 7.481 Å | 1,830 – 7,000 eV |
| Ge(220) | 4.001 Å | 3,440 – 13,000 eV |
| Si(111) | 6.271 Å | 2,180 – 8,350 eV |