Facility and Equipment Availability
Facility and Equipment Availability
Beamline 3.2Ua/b · Photoemission Spectroscopy (PES) & PEEM
Facility and Equipment Availability
Equipment at each end station & support facilities
ARPES End Station
| Equipment or Component | Details |
|---|---|
| Scienta R4000 hemispherical electron energy analyzer with +/- 15° angle multiplexing lens. | Analyzer entrance slit vertical, along main rotation axis of manipulator for Fermi surface maps. |
| Six-degree-of-freedom sample cryogenic manipulator (Gold sheet is installed on the manipulator) from Fermi Instruments | 5-axis X, Y, Z, R1 (polar), and R3 (tilt) with control motor and R2 (azimuth) with manual screw. XYZ and angular axis accuracy is 0.01 mm and 0.1 deg.
|
| Variable temperature 8 – 300 K | Take 8 hours from room temperature to 8 K. |
| Sample check and orientation by LEED | Maximum at 1 keV electron energy |
| Evaporation deposition on sample surface | Two slots of alkali metal evaporated source (K, Na, Li). Requirements need to be discussed with beamline scientists. |
| Ar ion sputtering gun | Maximum energy is 3 keV, and working pressure is ~10⁻⁶ mbar at preparation chamber |
| Gases flow into the preparation chamber | Ar, N₂, O₂, etc., gas flowing at the preparation chamber requirements need to be discussed with beamline scientists. |
| The MBE chamber is connected for annealing a sample or material deposition. | The maximum temperature of the heater is 700°C, with a pressure base of 10⁻⁹ mbar. Material deposition needs to be discussed with beamline scientists. |
| Load-lock with 7 slots of sample holders | Takes 1.5 hours to pump down for preparing pressure to transfer a sample into the main chamber without breaking UHV |
| Electrical connection with manipulator | Available to apply a voltage bias to a sample or measure current on a sample. |
| Fermi BL1200s Multi-Gas Ultra-High Flux VUV source system | An additional fixed VUV source component system with a He-discharged gas source and a monochromator generates photon energy of 21.22 eV |
XPS End Station
| Equipment or Component | Details |
|---|---|
| Hemispherical Electron Energy Analyzer: Thermo VG Scientific Alpha110 | Total minimum energy resolution at 200 meV and RT, and typical XPS Au4f7/2 FWHM is about 0.8 eV at the pass energy of 10 and photon energy of 400 eV |
| 4-axis manipulator | X, Y, Z, and R1 (polar) 0-180 deg |
| Ar ion sputtering gun | Maximum energy is 3 keV, and working pressure is ~10⁻⁶ mbar in the main chamber |
| Electron gun | The energy up to 5 keV |
| Load-lock with 2 slots of sample holder plate | Takes at least 1.5 hours (depending on the sample type) to pump down for preparing pressure to transfer a sample into the main chamber without breaking UHV |
| Total Fluorescence Yield detector | Hamamatsu photonics multi-channel plate |
| Electrical connection with manipulator | Available to apply a voltage bias to a sample or measure current on a sample. |
| Flux monitor | Gold mesh and photodiode |
| Large sample holder plate | 28 mm x 94 mm sample plate, able to load several samples in the main chamber (numbers of samples depend on the sample size). |
PEEM End Station
| Equipment or Component | Details |
|---|---|
| Hemispherical electron energy analyzer with Micro-channel plate, Sensicam QE CCD camera | Model: Elmitec PEEM III |
| Electron gun low-energy electron microscopy (LaB6 thermionic emission) | LEED pattern, LEED-IV, EELS incidence electron energy from -10 to 500 V |
| 3-axis manipulator with heater | The sample can be heated by thermal filament up to 600°C |
| Electron bombardment heating | The sample temperature can be more than 1200°C at a maximum current |
| IR pyrometer | It detects IR radiation from the sample and converts it to temperature in real time using the sample’s emissivity. |
| Ar ion sputtering gun | Maximum energy is 3 keV, and working pressure is ~10⁻⁶ mbar in the preparation chamber. |
| E-beam evaporation cell | Requirements need to be discussed with beamline scientists. |
| Gases flow into the preparation and main chamber | Ar, N₂, O₂, etc., gas flowing requirements need to be discussed with beamline scientists. |
| Load-lock with 2 slots of sample holder | Takes at least 1.5 hours (depending on the sample type) to pump down for preparing pressure to transfer a sample into the main chamber without breaking UHV |
Support Facilities
| Equipment or Component | Details |
|---|---|
| Digital hotplate | Temperature range: 5-550°C, ± 2.0°C |
| Low-to-Mid Range Magnification Digital Microscope LEICA DMS1000 | The optics ensures magnification of up to 300x. The built-in HDMI microscope camera provides full high definition live images of up to 30 fps and a resolution of 5M pixels. |
| Ultrasonic cleaner | – |
| Silver epoxy, high temperature Carbon paste | – |
| Cu, Al, Ni plates | For powder sample substrate of powder specimen |
| Carbon and Copper tape | – |
| Ceramic and Al wire top-post | For cleavable samples |
| Sample holders | – |
| Desiccator Cabinet | – |
| Spot welding tool | – |