สถาบันวิจัยแสงซินโครตรอน (องค์การมหาชน)

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Technology / Beamline System / Beamline 5.2 W

Beamline Layout and Specification

Beamline Layout and Specification

Beamline 5.2 Optical Layout

Figure 2 Schematic of the BL5.2 beamline configuration
Figure 2 Schematic of the BL5.2 beamline configuration

The beam transport system consists of the following main sections:

  • Front End: Located immediately after the storage ring, with safety shutters and fast valves that isolate the beamline vacuum from the storage ring.
  • Optics Section: Contains the heat absorber, X-ray beam position monitor and double crystal monochromator.
    • Heat Absorber (ABS): Protects downstream optical components from the high heat load of the white X-ray beam.
    • X-ray Beam Position Monitor (XBPM): Monitors the vertical position and intensity of the incident beam.
    • Double Crystal Monochromator (DCM): Selects the monochromatic X-ray energy using changeable InSb(111), Ge(220) or Si(111) crystals.

Beamline 5.2 Specification

Parameter Specification
Energy range 1,810 – 13,000 eV
Photon flux 108 – 1010 photons/sec/100 mA
Energy resolution 2 × 10−4
X-ray source 1.44 T bending magnet
Beam energy 1.2 GeV
Beam current 70 – 150 mA
Monochromator Fixed-exit double crystal monochromator

Crystals Available at Beamline 5.2

Crystal 2d spacing Energy range
InSb(111) 7.481 Å 1,830 – 7,000 eV
Ge(220) 4.001 Å 3,440 – 13,000 eV
Si(111) 6.271 Å 2,180 – 8,350 eV